Canon launches new “Grade 10” productivity upgrade option for FPA-6300ES6a KrF scanners that achieves industry-leading high productivity standard of 300 WPH

TOKYO, June 13, 2022—Canon Inc. today announced that the company has started selling a new “Grade 10” productivity upgrade option for its FPA-6300ES6a KrF semiconductor lithography equipment1. Upgrade enables throughput of 300 wafers per hour (WPH)2highest in the industry3 productivity level among 300 mm wafer KrF semiconductor lithography systems.

FPA-6300ES6a

An FPA-6300ES6a system operating in a factory

An FPA-6300ES6a system operating in a factory

Along with the demand for solid-state devices, the demand is growing for solid-state lithography equipment that offers increased levels of productivity. Since the launch of the FPA-6300ES6a KrF scanner in April 2012, Canon has continuously developed productivity-enhancing options, available as upgrades for existing units that have earned accolades and a reputation for high reliability on the market. When equipped with the new Grade 10 productivity upgrade option, the FPA-6300ES6 achieves productivity levels of 300 WPH. Additionally, the company plans to release an upgrade in 2023 that will allow the FPA-6300ES6a to support 200mm wafers as well.

By increasing stage and transfer system speeds, the new Grade 10 productivity upgrade option dramatically reduces exposure processing time and achieves the highest throughput in the industry, 300 WPH. Additionally, by implementing a new scene control system that uses a neural network4— a first for Canon’s solid-state lithography systems — vibration caused by high-speed stage movement is reduced, maintaining a high degree of accuracy. Additionally, using the new Grade 10 productivity upgrade option alongside the optional overlay accuracy upgrade, system owners can achieve high-speed manufacturing with overlay accuracy as accurate as 4 nanometers.5.

Upgrade can be installed on users’ existing FPA-6300ES6a6 systems currently in use in mass production factories. Since no replacement is required, productivity can be further improved.

By continuing to offer a wide range of productivity-enhancing solutions and upgrade options for its solid-state lithography systems, Canon is meeting the growing productivity needs of users.

The Year 10 Productivity Upgrade option will be available beginning in early August 2022.

  • 1A semiconductor lithography system uses a laser with an exposure wavelength of 248 nm generated by combining rare gas krypton (Kr) and halogen gas fluoride (F). A nanometer is equal to one billionth of a meter.
  • 2Among the KrF scanners compatible with 300 mm substrates. As of June 12, 2022. Based on Canon survey.
  • 3The amount of 300 mm wafers exposed in one hour at 96 shots per wafer.
  • 4A form of machine learning modeled after the configuration of the human brain.
  • 5 Single Machine Overlay
  • 6FPA-6300ES6a systems with the “Plus” option installed.

Reference

Scanners

Semiconductor lithography equipment that uses the “stepping and scanning method”, which involves the simultaneous movement of the reticle stage and the wafer stage, are commonly referred to as “scanners”. Although the overall system is more complex, scanners are able to cover the entire exposure angle through the scanning process. This allows for the design of a smaller lens, resulting in less aberration and distortion, thus simplifying the manufacturing process. This in turn results in greater exposure accuracy.

Overview of Solid State Lithography Equipment

Canon Solid State Lithography Systems

Canon manufactures a wide range of solid-state lithography systems, including systems using KrF and i-line light sources, to meet a wide and growing range of customer needs for systems designed for field production large or small substrates as well as the production of devices for the Internet of Things.
https://global.canon/en/product/indtech/semicon/

The Canon Lithography System website and the 50th anniversary website

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